IEEE Photonics Journal (Jan 2012)

Characterization of Mid-Infrared Silicon-on-Sapphire Microring Resonators With Thermal Tuning

  • Chi Yan Wong,
  • Zhenzhou Cheng,
  • Xia Chen,
  • Ke Xu,
  • Christy K. Y. Fung,
  • Yi Min Chen,
  • Hon Ki Tsang

DOI
https://doi.org/10.1109/jphot.2012.2204734
Journal volume & issue
Vol. 4, no. 4
pp. 1095 – 1102

Abstract

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Microring resonators on silicon-on-sapphire (SOS) were characterized at 2.75 $\mu\hbox{m}$ wavelength. We obtained a $Q$ factor of 11400 $\pm$ 800. The thermo-optic coefficient of epitaxial silicon of SOS wafer was measured to be $2.11 \pm 0.08 \times 10^{-4}\ \hbox{K}^{-1}$. We also describe a characterization technique to measure the $Q$ of microring resonators using a fixed wavelength source. By only varying the temperature of the device, it is possible to measure the $Q$ of a mid-infrared (mid-IR) microresonator. The proposed method provides an alternative method of $Q$ measurement for microring resonators in mid-IR, where tunable lasers may not be easily available. The technique was used to determine the $Q$ of SOS microring resonators at 2.75 $\mu\hbox{m}$ wavelength.

Keywords